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Theoretical analysis of the implementation of a quantum phase gate with neutral atoms on atom chips

机译:用量子相位门实现的理论分析   原子芯片上的中性原子

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摘要

We present a detailed, realistic analysis of the implementation of a proposalfor a quantum phase gate based on atomic vibrational states, specializing it toneutral rubidium atoms on atom chips. We show how to create a double--wellpotential with static currents on the atom chips, using for all relevantparameters values that are achieved with present technology. The potentialbarrier between the two wells can be modified by varying the currents in orderto realize a quantum phase gate for qubit states encoded in the atomic externaldegree of freedom. The gate performance is analyzed through numericalsimulations; the operation time is ~10 ms with a performance fidelity above99.9%. For storage of the state between the operations the qubit state can betransferred efficiently via Raman transitions to two hyperfine states, whereits decoherence is strongly inhibited. In addition we discuss the limitsimposed by the proximity of the surface to the gate fidelity.
机译:我们提出了基于原子振动态的量子相门提案的实施方案的详细,现实分析,专门针对原子芯片上的中性rub原子。我们展示了如何使用当前技术实现的所有相关参数值,在原子芯片上创建具有静态电流的双势阱。可以通过改变电流来修改两个阱之间的势垒,以实现对于以原子外部自由度编码的量子位状态的量子相位门。通过数值模拟分析了浇口性能;操作时间约为10毫秒,性能保真度高于99.9%。为了在操作之间存储状态,可以通过拉曼跃迁有效地将量子位状态转换为两个超精细状态,在这种状态下,其去相干性受到强烈抑制。另外,我们讨论了表面与栅极保真度的接近所施加的限制。

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